The future technology in the semi conductor industry and production-
HMDS hotplate system for typical HMDS wafer priming and dehydration bake lithography applications:

OPTIhot SVT 20

• Stand - Alone HMDS (HexaMethylDiSilazan - C6H19NSi2)
  Vapor Prime Hotplate system for wafer up to Ø 8" (Ø 200 mm)
  and substrates up to 6" x 6" (150 mm x 150 mm) with
  programmable process parameter (HMDS, Nitrogen and Vacuum)

System consists of:

• Stand - Alone Cabinet with integrated Hotplate, media dosing unit and controller
• Hotplate System with vacuum chamber and cover
• Input display unit with touch
• Profiled and calibrated to Temperature Controller before shipment
• Including software for PC / Notebook - For more comfortable recipe writing and storage
• Including an ENGLISH manual on standard paper and a CD-ROM
• Price without installation and training

Technical data:

• Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A
• Temperature range: Up to 200°C - Adjustable in 0.1°C steps
• Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
• Programmable process: HMDS, Nitrogen (N2), Vacuum parameter
• Substrate Size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
• Process exhaust: Outer diameter OD 110 mm, 30m3/h
• Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system

Options

• "5 liter HMDS / N2 bubbler tank system stainless steel tank complete with pressure regulator and tubing exhaust for venting pressure tank system or media cabinet necessary"