The future technology in the semi conductor industry and production-
bench mounted Hotplate System for typical lithography baking applications:
OPTIhot HB 20+
- Bench Mounted Hotplate System for wafer up to Ø 8"
(Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)
System consists of:
Hotplate System with cover
Recipe programmable lifting pins (proximity) for 2" - 8" wafer
Recipe programmable Nitrogen (N2) blow
19" controller unit
Input display unit with touch
Preset and calibrated Temperature Controller
Including software for PC / Notebook - For more comfortable
recipe writing and storage
Including an ENGLISH manual on standard paper and a CD-ROM
Price without installation and training
Technical data:
Voltage: UAC= 230 V / N / PE / 50 Hz (60 Hz) / 16A
Temperature range: Up to 300°C - Adjustable in 0.1°C steps
Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
Lifting pins (Proximity): From Ø 2" up to Ø 8" - Programmable in 0.1 mm steps
Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
Process exhaust: Outer diameter OD 38mm, 30m3/h
Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
Vacuum: -0.8 ± 0.2 bar
Nitrogen (N2): 4.0 ± 0.5 bar
CE marked system
