The future technology in the semi conductor industry and production-
stand alone Hotplate System for typical lithography baking applications:

OPTIhot SHT 20

•  Stand - Alone Hotplate System for wafers up to Ø 8"
  (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)

System consists of:

• Stand - Alone Cabinet with integrated Hotplate
• Hotplate System with cover
• Lifting pins after process for 2" - 8" wafer
• Input controller
• Preset and calibrated temperature controller
• Including an ENGLISH manual on standard paper and a CD-ROM
• Hotplate System with cover and controller
• Price without installation and training

Technical data:

• Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A
• Temperature range: Up to 300°C - Adjustable in 1°C steps
• Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
• Substrate Size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
• Process exhaust: Outer diameter OD 110 mm, 30m3/h
• Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system
• Dimensions (W x D x H):
• Input Touch - Panel approx.: 166 mm x 45 mm x 100 mm (4.7" x 1.8" x 3.9")
• OPTIhot SHT 20 approx.: 600 mm x 600 mm x 1.320 mm (23.6" x 23.6" x 52")

Hotplate Options

• "Proximity - manual adjustable proximity"
• "Nitrogen (N2) blow - manual nitrogen blow - including media valve, tubing and flowmeter"