The future technology in the semiconductor industry and production-
Coating System with a process optimized covered chuck technology:

OPTIcoat ST 75

• Stand - Alone Spin Coating System with "Covered Chuck"
  technology for Wafers up to Ø 750 mm and substrates
  up to 20" x 20" (508 mm x 508 mm) for covered chuck spinning

System consists of:

• Stand - Alone cabinet with all process modules integrated
• Spinner System with Covered Chuck technology and automatic substrate pin lift
• Multi piece process bowl with splash ring
• Input display unit with touch
• Including software for PC / Notebook - For more comfortable
• recipe writing and storage
• Including an ENGLISH manual on standard paper and a CD-ROM
• Requires at least one chuck (Not included !)

Technical data:

• Voltage: UAC= 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
• Motor speed: 1 up to 2,000 rpm - Adjustable in 1 rpm steps (depends on substrate weight and size)
• Motor acceleration ramp: 1 up to 2.500 rpm/s - Adjustable in 1 rpm/s steps (depends on substrate / chuck weight and size)
• Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
• Substrate size: Up to Ø 750 mm or 20" x 20" (508 mm x 508 mm)
• Process bowl: Standard made of Polypropylene (PP)
• Process exhaust#1: Outer diameter OD 110 mm, 200m3/h
• Process exhaust#2+#3: Outer diameter OD 110 mm, each 200m3/h
• Cabinet exhaust#1: Outer diameter OD 140 mm, 300m3/h
• Cabinet exhaust#2: Outer diameter OD 110 mm, 200m3/h
• Drain: 5 liter waste tank and high-level sensor
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2) Optional: 4.0 ± 0.5 bar
• CE marked system