The future technology in the semiconductor industry and production-
Stand alone spinner module for coating; cleaning, developing, hotplate and HMDS within process

OPTIspin ST 23+

• Stand - Alone Spinner System for Coating, Cleaning or Developing applications with hotplate and HMDS (HexaMethylDiSilazan -C6H19NSi2) hotplate for wafer up to Ø 8" (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)

System consists of:

• Spinner system with process bowl cover (hardware interlock secured)
• Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
• Hotplate OPTIhot HB 20+ with programmable lifting pins (proximity) for 2" - 8" wafer
• Programmable Nitrogen (N2) blow
• Vapor prime HMDS (HexaMethylDiSilazan) hotplate OPTIhot VB 20
• Input display unit with touch for each system
• USB 2.0 port for data exchange
• Including software for PC / Notebook - For more comfortable recipe writing and storage
• Including an ENGLISH manual on standard paper and a CD-ROM
• Price without installation and training
• Requires at least one chuck (Not included !)

Technical Data:

• Voltage: UAC = 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
• Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
• Process exhaust: Outer diameter OD 110 mm, 200m3/h
• Cabinet exhaust #1: Outer diameter OD 110 mm, 200m3/h
• Cabinet / HP exhaust #2: Outer diameter OD 110 mm, 200m3/h
• Process exhaust HMDS: Outer diameter OD 110 mm, 200m3/h
• Cabinet exhaust HMDS: Outer diameter OD 110 mm, 200m3/h
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system

Chucks: Option

Dispense: Option

Nozzle: Option

Hotplate: Option