The future technology in the semiconductor industry and production-
Stand Alone Spinner system for coating, cleaning and developing within process:

OPTIspin ST 20

• Stand - Alone Spinner System for Coating, Cleaning or Developing applications for wafer up to Ø 8" (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)

System consists of:

• Stand - Alone cabinet with all process modules integrated
• Spinner system with process bowl cover (hardware interlock secured)
• Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
• Input display unit with touch
• USB 2.0 port for data exchange
• Including software for PC / Notebook - For more comfortable recipe writing and storage
• Including an ENGLISH manual on standard paper and a CD-ROM
• Price without installation and training
• Requires at least one chuck (Not included !)

Technical data:

• Voltage: UAC = 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
• Motor-Speed: 1 up to 10,000rpm* in 1rpm steps
• Motor-Acceleration ramp: 1 up to 50,000 rpm/sec* in steps
• 1rpm/sec *(depending on substrate size and load)
• Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
• Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
• Process bowl Standard made of Polypropylene (PP)
• Process exhaust: Outer diameter OD 110 mm, 200m3/h
• Cabinet exhaust #1: Outer diameter OD 110 mm, 200m3/h
• Cabinet exhaust #2: Outer diameter OD 110 mm, 200m3/h
• Drain: 5 liter waste tank and high-level sensor, inside the cabinet
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system

Chucks: Option

Dispense: Option

Nozzle: Option

Hotplate: Option