The future technology in the semiconductor industry and production-
Stand alone spinner module for coating; cleaning, developing and hotplate within process

OPTIspin ST 22

• Stand - Alone Spinner System for Coating, Cleaning or Developing applications with hotplate for wafer up to Ø 8" (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)

System consists of:

• Stand - Alone cabinet with all process modules integrated
• Spinner system with process bowl cover (hardware interlock secured)
• Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
• Hotplate OPTIhot HB 20 with lifting pins for 2" up to 8"
• Input display unit with touch for spin coater
• Temperature controller and timer for hotplate
• USB 2.0 port for data exchange
• Including software for PC / Notebook - For more comfortable recipe writing and storage
• Including an English manual on normal paper and a CD-Rom
• Price without installation and training
• Requires at least one chuck (Not included !)

Technical Data:

• Voltage: UAC= 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
• Motor-Speed: 1 up to 10,000rpm* in 1rpm steps
• Motor-Acceleration ramp: 1 up to 50,000 rpm/sec* in steps 1rpm/sec *(depending on substrate size and load)
• Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
• Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
• Process bowl Standard made of Polypropylene (PP)
• Process exhaust: Outer diameter OD 110 mm, 200m3/h
• Cabinet exhaust #1: Outer diameter OD 110 mm, 200m3/h
• Cabinet / HP exhaust #2: Outer diameter OD 110 mm, 200m3/h
• Drain: 5 liter waste tank and high-level sensor, inside the cabinet
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system

Hotplate: Option