The future technology in the semiconductor industry and production-Spin Wet Process System within process:

OPTIwet ST 60

• Stand - Alone Spin Wet Process System for wafer up to Ø 22” (Ø 560 mm) and substrates up to 16” x 16” (400 mm x 400 mm)

System consists of:

• Stand - Alone cabinet with all process modules integrated
• Process chamber made of polypropylene (PP) safety door
• Including one programmable electronic media arm – Programmable in speed and position
• Including Back Side Rinse nozzle for DI-Water
• Emergency Stop Button
• Input display unit with touch
• USB 2.0 port for data exchange
• Including software for PC / Notebook – For more comfortable recipe writing and storage
• Including an ENGLISH manual on standard paper and a CD-ROM
• Price without installation and training
• Requires at least one chuck

 
Technical data:

• Voltage: UAC= 3 x 400 V / N / PE / 50 Hz / 16A
• Motor speed: 1 – 3.000 rpm – Adjustable in 1 rpm steps (pending on substrate size and load)
• Motor acceleration ramp: 1 up to 500 rpm/s – Adjustable in 1 rpm/s steps (pending on substrate size and load)
• Spinning time: 1 up to 999 s – Adjustable in 0.1 s steps
• Substrate size: Up to Ø 22” (Ø 560 mm) or 16” x 16” (400 mm x 400 mm)
• Process chamber: Standard made of Polypropylene (PP)
• Process bowl exhaust: 2 x outer diameter OD 110mm, each 200m3/h
• Chamber exhaust: 2 x outer diameter OD 140mm, each 300m3/h
• Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
• Controller exhaust: Outer diameter OD 110 mm, 200m3/h
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• Media drain connection to the house drain
• CE marked system