The future technology in the semiconductor industry and production-
Spin Wet Process System within process:

OPTIwet ST 75

• Stand - Alone Spin Wet Process System for substrates up to Ø 750 mm or up to 20” x 20” (508 mm x 508 mm)

System consists of:

• Stand - Alone cabinet with all process modules integrated
• Process chamber made of polypropylene (PP) safety door
• Including one programmable electronic media arm – Programmable in speed and position
• Including Back Side Rinse nozzle for DI-Water
• Emergency Stop Button
• Input display unit with touch
• USB 2.0 port for data exchange
• Including software for PC / Notebook – For more comfortable recipe writing and storage
• Including an ENGLISH manual on standard paper and a CD-ROM
• Price without installation and training
• Requires at least one chuck
   

Technical data:

• Voltage: UAC= 3 x 400 V / N / PE / 50 Hz / 32A
• Motor speed: 1 – 1.200 rpm – Adjustable in 1 rpm steps (pending on substrate size and load)
• Motor acceleration ramp: 1 up to 150 rpm/s – Adjustable in 1 rpm/s steps (pending on substrate size and load)
• Spinning time: 1 up to 999 s – Adjustable in 0.1 s steps
• Substrate size: Up to 30” (Ø 762 mm) oder 20” x 20” (508 mm x 508 mm)
• Process chamber: Standard made of Polypropylene (PP)
• Process bowl exhaust:Outer diameter OD 110 mm, 200m3/h
• Chamber exhaust: 2 x outer diameter OD 140 mm, each 300m3/h
• Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
• Controller exhaust: Outer diameter OD 110 mm, 200m3/h
• Media drain connection to the house drain
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system