ATMgroup

Product data sheet

Hotplate- OPTIhot SHT20+

Article number: 51-0004-04-00

The future technology in the semi conductor industry and production-
stand alone Hotplate System for typical lithography baking applications:

OPTIhot SHT 20+

  • Stand - Alone Hotplate System for wafer up to Ø 8" (Ø 200mm)
      and substrates up to 6" x 6" (150mm x 150mm)

System consists of:

  •  Stand-Alone Cabinet with integrated Hotplate and controller
  • Recipe programmable lifting pins (proximity) for 2" - 8" wafer
  • Recipe programmable Nitrogen (N2) blow
  • Input display unit with touch
  • Preset and calibrated Temperature Controller
  • Including software for PC / Notebook - For more comfortable recipe writing and storage
  • Including am ENGLISH manual on standard paper and a CD-ROM
  • Price without installation and training

Technical data:

  • Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A
  • Temperature range: Up to 300°C - Adjustable in 0.1°C steps
  • Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
  • Lifting pins (Proximity): From Ø 2" up to Ø 8" - Programmable in 0.1 mm steps
  • Substrate Size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
  • Process exhaust: Outer diameter OD 110 mm, 30m3/h
  • Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
  • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
  • Vacuum: -0.8 ± 0.2 bar
  • Nitrogen (N2): 4.0 ± 0.5 bar
  • CE marked system